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150 Heat-able UV-Ozone Cleaner w/ 6"x 6" Chamber & Quartz Holder- PCE66H
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150 Heat-able UV-Ozone Cleaner w/ 6"x 6" Chamber & Quartz Holder- PCE66H

150 Heat-able UV-Ozone Cleaner w/ 6"x 6" Chamber & Quartz Holder- PCE66H

PCE-66H is a compact and heatable Ultraviolet (UV) Ozone cleaner, which is a dedicated system to remove a variety of contaminants from the surfaces of substrates samples. UV Ozone cleaning is simple to use in the dry process which is a highly effective method to clean surfaces. The cleaning effect is caused by irradiating the surface of a substrate with suitable lamps creating enough energy in the UltraViolet spectrum range. It is the photo-sensitized oxidation process by atomized Oxygen and highly reactive Ozone. The UV radiation directly to the surface stimulates the reaction. Volatile hydrocarbon products are produced. The removal of hydrocarbons in nanometer thickness by oxidation results in ultra-clean surfaces with significant wettability. This is very important before the thin-film coating process of glass and ceramic surfaces. Built-in heating tube, capable of heating the substrate, with a maximum heating temperature of 150°C. Temperature control is achieved through PID control, allowing for the setting of 30-segment temperature programs.

SPECIFICATIONS
Power
  • 750w
  • AC 220V±10%, 50/60Hz
  • AC110V is available by a 1000W 110V-220C transformer ( click underlined to order )
UV Lamp
  • Form: UV lamp tube
  • Power: 8W*4=32W
  • Wavelength: 185nm+254nm
  • Irradiation Area: 150*150mm
  • Light Intensity: 80ÎĽW / cm2
  • Click here to order more UV Lamp for replacement
Chamber & Sample Stage

  • Quartz Sample Holder: 105mm x 102mm x 20mm (L x W x H)
  • Pull-out Box Size: 200mm x 230mm x 23mm
Temperature & Time Control
  • The bottom of the substrate holder is equipped with a W-shaped stainless steel heating tube.
  • Maximum heating temperature: 150
  • PID automatic temperature control system.
  • Intelligent 30-segment programmable control.
  • Built-in overheat protection and thermocouple failure alarm.
  • Temperature control accuracy: ±1.
  • Irradiation Time Setting: 0-30 minutes
Exhausting Fan
  • An exhausting duct with a fan is installed on the back of the O-Zone cleaner.
  • Easy to connect with an air pipe for exhausting the O-zone gas generated by the cleaner to the outside of the building.
  • φ80mm.
Application
  • Cleaning molecular contamination from SPTs, AFM tips, and surfaces
  • Curing UV-adhesives
  • UV-photopatterning of SAM surfaces
  • Oxidizing PDMS
  • Surface sterilization
  • Etch, pattern, sharpen
  • Clean MEMS devices
  • Clean substrate surfaces such as Si, Ge, GaAs, and all oxide crystal substrate
Reference articles

 

 

 

$1,495.80

Original: $4,986.00

-70%
150 Heat-able UV-Ozone Cleaner w/ 6"x 6" Chamber & Quartz Holder- PCE66H—

$4,986.00

$1,495.80

More Images

150 Heat-able UV-Ozone Cleaner w/ 6"x 6" Chamber & Quartz Holder- PCE66H - Image 2
150 Heat-able UV-Ozone Cleaner w/ 6"x 6" Chamber & Quartz Holder- PCE66H - Image 3
150 Heat-able UV-Ozone Cleaner w/ 6"x 6" Chamber & Quartz Holder- PCE66H - Image 4

150 Heat-able UV-Ozone Cleaner w/ 6"x 6" Chamber & Quartz Holder- PCE66H

PCE-66H is a compact and heatable Ultraviolet (UV) Ozone cleaner, which is a dedicated system to remove a variety of contaminants from the surfaces of substrates samples. UV Ozone cleaning is simple to use in the dry process which is a highly effective method to clean surfaces. The cleaning effect is caused by irradiating the surface of a substrate with suitable lamps creating enough energy in the UltraViolet spectrum range. It is the photo-sensitized oxidation process by atomized Oxygen and highly reactive Ozone. The UV radiation directly to the surface stimulates the reaction. Volatile hydrocarbon products are produced. The removal of hydrocarbons in nanometer thickness by oxidation results in ultra-clean surfaces with significant wettability. This is very important before the thin-film coating process of glass and ceramic surfaces. Built-in heating tube, capable of heating the substrate, with a maximum heating temperature of 150°C. Temperature control is achieved through PID control, allowing for the setting of 30-segment temperature programs.

SPECIFICATIONS
Power
  • 750w
  • AC 220V±10%, 50/60Hz
  • AC110V is available by a 1000W 110V-220C transformer ( click underlined to order )
UV Lamp
  • Form: UV lamp tube
  • Power: 8W*4=32W
  • Wavelength: 185nm+254nm
  • Irradiation Area: 150*150mm
  • Light Intensity: 80ÎĽW / cm2
  • Click here to order more UV Lamp for replacement
Chamber & Sample Stage

  • Quartz Sample Holder: 105mm x 102mm x 20mm (L x W x H)
  • Pull-out Box Size: 200mm x 230mm x 23mm
Temperature & Time Control
  • The bottom of the substrate holder is equipped with a W-shaped stainless steel heating tube.
  • Maximum heating temperature: 150
  • PID automatic temperature control system.
  • Intelligent 30-segment programmable control.
  • Built-in overheat protection and thermocouple failure alarm.
  • Temperature control accuracy: ±1.
  • Irradiation Time Setting: 0-30 minutes
Exhausting Fan
  • An exhausting duct with a fan is installed on the back of the O-Zone cleaner.
  • Easy to connect with an air pipe for exhausting the O-zone gas generated by the cleaner to the outside of the building.
  • φ80mm.
Application
  • Cleaning molecular contamination from SPTs, AFM tips, and surfaces
  • Curing UV-adhesives
  • UV-photopatterning of SAM surfaces
  • Oxidizing PDMS
  • Surface sterilization
  • Etch, pattern, sharpen
  • Clean MEMS devices
  • Clean substrate surfaces such as Si, Ge, GaAs, and all oxide crystal substrate
Reference articles

 

 

 

Product Information

Shipping & Returns

Description

PCE-66H is a compact and heatable Ultraviolet (UV) Ozone cleaner, which is a dedicated system to remove a variety of contaminants from the surfaces of substrates samples. UV Ozone cleaning is simple to use in the dry process which is a highly effective method to clean surfaces. The cleaning effect is caused by irradiating the surface of a substrate with suitable lamps creating enough energy in the UltraViolet spectrum range. It is the photo-sensitized oxidation process by atomized Oxygen and highly reactive Ozone. The UV radiation directly to the surface stimulates the reaction. Volatile hydrocarbon products are produced. The removal of hydrocarbons in nanometer thickness by oxidation results in ultra-clean surfaces with significant wettability. This is very important before the thin-film coating process of glass and ceramic surfaces. Built-in heating tube, capable of heating the substrate, with a maximum heating temperature of 150°C. Temperature control is achieved through PID control, allowing for the setting of 30-segment temperature programs.

SPECIFICATIONS
Power
  • 750w
  • AC 220V±10%, 50/60Hz
  • AC110V is available by a 1000W 110V-220C transformer ( click underlined to order )
UV Lamp
  • Form: UV lamp tube
  • Power: 8W*4=32W
  • Wavelength: 185nm+254nm
  • Irradiation Area: 150*150mm
  • Light Intensity: 80ÎĽW / cm2
  • Click here to order more UV Lamp for replacement
Chamber & Sample Stage

  • Quartz Sample Holder: 105mm x 102mm x 20mm (L x W x H)
  • Pull-out Box Size: 200mm x 230mm x 23mm
Temperature & Time Control
  • The bottom of the substrate holder is equipped with a W-shaped stainless steel heating tube.
  • Maximum heating temperature: 150
  • PID automatic temperature control system.
  • Intelligent 30-segment programmable control.
  • Built-in overheat protection and thermocouple failure alarm.
  • Temperature control accuracy: ±1.
  • Irradiation Time Setting: 0-30 minutes
Exhausting Fan
  • An exhausting duct with a fan is installed on the back of the O-Zone cleaner.
  • Easy to connect with an air pipe for exhausting the O-zone gas generated by the cleaner to the outside of the building.
  • φ80mm.
Application
  • Cleaning molecular contamination from SPTs, AFM tips, and surfaces
  • Curing UV-adhesives
  • UV-photopatterning of SAM surfaces
  • Oxidizing PDMS
  • Surface sterilization
  • Etch, pattern, sharpen
  • Clean MEMS devices
  • Clean substrate surfaces such as Si, Ge, GaAs, and all oxide crystal substrate
Reference articles

 

 

 

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