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0.7 L Plasma Cleaner with Digital Vacuum Gauge, 3"Dx 6.5"L Quartz Chamber, 13.56 Mhz - PCE3
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0.7 L Plasma Cleaner with Digital Vacuum Gauge, 3"Dx 6.5"L Quartz Chamber, 13.56 Mhz - PCE3

0.7 L Plasma Cleaner with Digital Vacuum Gauge, 3"Dx 6.5"L Quartz Chamber, 13.56 Mhz - PCE3

PCE-3 ( upgraded from PDC-32G-LD ) is a 3" compact plasma cleaner with digital vacuum sensor and display, and as well as the hinged door. which is designed for cleaning and removing nanoscale organic contamination on wafer up to 2" with various gas easily. The rate of organic removal is about 10 nm/min Maximum at high RF power. It is an excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality. If you do not have any experience for plasma surface cleaning, please refer to the articles as the follows:
  • McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts. "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon." Langmuir (2006) 22(13): 5617-5624.
  • Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts. "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere." Phys. Chem. Chem. Phys. (2004) 6: 604-613.
  • Mennicke, Ulrike, Tim Salditt. "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating." Langmuir (2002) 18: 8172-8177.
SPECIFICATIONS

Features
  • Cleaning and removing nanoscale organic contamination on wafers up to 2" with various gas easily.
  • Excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality
  • Hinged-type door for easy sample loading.
  • 3" Diameter Quartz Chamber excellent for cleaning 2" wafers with option Quartz Boat
  • The removable Quartz tube inside Quartz Chamber is easy to clean and replace.

RF Power		 Input: Cleaner AC 208 - 240V, 50/60Hz, single phase, 20W ( for 110VAC, may use a transformer 
Output: RF power (High voltage & high-frequency current applied on the coil) is adjustable at three levels:
Low Setting 680V  10 mA  7 W
Medium Setting 700V  15 mA  11 W
High Setting 720V  25 mA  18 W
Plasma Chamber
  • 3" diameter x 6.5" length quartz chamber
  • 700 mL capacity
  • High-purity quartz has a longer service life than glass.
Vacuum Gauge & Display
  • A digital vacuum gauge is installed on the hinged door.
  • 1/8" NPT needle valve to qualitatively control gas flow and chamber pressure.
  • 1/8" NPT 3-way valve to quickly switch from bleeding in gas, isolating the chamber, and venting.
Vacuum Pump 
Input Power
  • Cleaner AC 208 - 240V, 50/60Hz, single phase
  • Vacuum pump AC 208 - 240V, 50/60Hz, single phase (Cleaner controls the power line of the pump.)
  • For operation under AC110V, you may order additional (1500W transformer)

Working Gases
  • Many inert gases can be chosen for plasma cleanings, such as N2, Ar, Air, and Mixed gas depending on what kind of material will be treated. ( Please select the two-channel gas mixer from the model selection)
  • <5% H2 mixed inert gas can be used
  • No flammable gas shall be used for the plasma cleaner.
Overall dimension
 Net Weight of Plasma Cleaner 40 Lbs
Shipping Weight & Dimensions 100 lbs
40"x24"x26"


Optional Accessories
  • You may order a Removable Quartz tube(80 O.D, 205 L mm) at extra cost.
  • Combinations of PCE-3 plasma cleaner with Two Channel Gas Mixer will be a solution for introducing up to two (2) process gases. Order plasma cleaner with the two-channel gas mixer from product options or Click the picture below for Two-Channel Gas Mixer.
  • You may order a quartz wafer carrier to clean 2" wafer
Compliance
  • CE approval
  • NRTL certification is NOT available temporarily.
Warranty One-year limited warranty with lifetime support ( no warranty for Pyrex glass chamber )

 

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From $3,749.40

Original: $12,498.00

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0.7 L Plasma Cleaner with Digital Vacuum Gauge, 3"Dx 6.5"L Quartz Chamber, 13.56 Mhz - PCE3—

$12,498.00

$3,749.40

0.7 L Plasma Cleaner with Digital Vacuum Gauge, 3"Dx 6.5"L Quartz Chamber, 13.56 Mhz - PCE3

PCE-3 ( upgraded from PDC-32G-LD ) is a 3" compact plasma cleaner with digital vacuum sensor and display, and as well as the hinged door. which is designed for cleaning and removing nanoscale organic contamination on wafer up to 2" with various gas easily. The rate of organic removal is about 10 nm/min Maximum at high RF power. It is an excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality. If you do not have any experience for plasma surface cleaning, please refer to the articles as the follows:
  • McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts. "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon." Langmuir (2006) 22(13): 5617-5624.
  • Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts. "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere." Phys. Chem. Chem. Phys. (2004) 6: 604-613.
  • Mennicke, Ulrike, Tim Salditt. "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating." Langmuir (2002) 18: 8172-8177.
SPECIFICATIONS

Features
  • Cleaning and removing nanoscale organic contamination on wafers up to 2" with various gas easily.
  • Excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality
  • Hinged-type door for easy sample loading.
  • 3" Diameter Quartz Chamber excellent for cleaning 2" wafers with option Quartz Boat
  • The removable Quartz tube inside Quartz Chamber is easy to clean and replace.

RF Power		 Input: Cleaner AC 208 - 240V, 50/60Hz, single phase, 20W ( for 110VAC, may use a transformer 
Output: RF power (High voltage & high-frequency current applied on the coil) is adjustable at three levels:
Low Setting 680V  10 mA  7 W
Medium Setting 700V  15 mA  11 W
High Setting 720V  25 mA  18 W
Plasma Chamber
  • 3" diameter x 6.5" length quartz chamber
  • 700 mL capacity
  • High-purity quartz has a longer service life than glass.
Vacuum Gauge & Display
  • A digital vacuum gauge is installed on the hinged door.
  • 1/8" NPT needle valve to qualitatively control gas flow and chamber pressure.
  • 1/8" NPT 3-way valve to quickly switch from bleeding in gas, isolating the chamber, and venting.
Vacuum Pump 
Input Power
  • Cleaner AC 208 - 240V, 50/60Hz, single phase
  • Vacuum pump AC 208 - 240V, 50/60Hz, single phase (Cleaner controls the power line of the pump.)
  • For operation under AC110V, you may order additional (1500W transformer)

Working Gases
  • Many inert gases can be chosen for plasma cleanings, such as N2, Ar, Air, and Mixed gas depending on what kind of material will be treated. ( Please select the two-channel gas mixer from the model selection)
  • <5% H2 mixed inert gas can be used
  • No flammable gas shall be used for the plasma cleaner.
Overall dimension
 Net Weight of Plasma Cleaner 40 Lbs
Shipping Weight & Dimensions 100 lbs
40"x24"x26"


Optional Accessories
  • You may order a Removable Quartz tube(80 O.D, 205 L mm) at extra cost.
  • Combinations of PCE-3 plasma cleaner with Two Channel Gas Mixer will be a solution for introducing up to two (2) process gases. Order plasma cleaner with the two-channel gas mixer from product options or Click the picture below for Two-Channel Gas Mixer.
  • You may order a quartz wafer carrier to clean 2" wafer
Compliance
  • CE approval
  • NRTL certification is NOT available temporarily.
Warranty One-year limited warranty with lifetime support ( no warranty for Pyrex glass chamber )

 

Product Information

Shipping & Returns

Description

PCE-3 ( upgraded from PDC-32G-LD ) is a 3" compact plasma cleaner with digital vacuum sensor and display, and as well as the hinged door. which is designed for cleaning and removing nanoscale organic contamination on wafer up to 2" with various gas easily. The rate of organic removal is about 10 nm/min Maximum at high RF power. It is an excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality. If you do not have any experience for plasma surface cleaning, please refer to the articles as the follows:
  • McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts. "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon." Langmuir (2006) 22(13): 5617-5624.
  • Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts. "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere." Phys. Chem. Chem. Phys. (2004) 6: 604-613.
  • Mennicke, Ulrike, Tim Salditt. "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating." Langmuir (2002) 18: 8172-8177.
SPECIFICATIONS

Features
  • Cleaning and removing nanoscale organic contamination on wafers up to 2" with various gas easily.
  • Excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality
  • Hinged-type door for easy sample loading.
  • 3" Diameter Quartz Chamber excellent for cleaning 2" wafers with option Quartz Boat
  • The removable Quartz tube inside Quartz Chamber is easy to clean and replace.

RF Power		 Input: Cleaner AC 208 - 240V, 50/60Hz, single phase, 20W ( for 110VAC, may use a transformer 
Output: RF power (High voltage & high-frequency current applied on the coil) is adjustable at three levels:
Low Setting 680V  10 mA  7 W
Medium Setting 700V  15 mA  11 W
High Setting 720V  25 mA  18 W
Plasma Chamber
  • 3" diameter x 6.5" length quartz chamber
  • 700 mL capacity
  • High-purity quartz has a longer service life than glass.
Vacuum Gauge & Display
  • A digital vacuum gauge is installed on the hinged door.
  • 1/8" NPT needle valve to qualitatively control gas flow and chamber pressure.
  • 1/8" NPT 3-way valve to quickly switch from bleeding in gas, isolating the chamber, and venting.
Vacuum Pump 
Input Power
  • Cleaner AC 208 - 240V, 50/60Hz, single phase
  • Vacuum pump AC 208 - 240V, 50/60Hz, single phase (Cleaner controls the power line of the pump.)
  • For operation under AC110V, you may order additional (1500W transformer)

Working Gases
  • Many inert gases can be chosen for plasma cleanings, such as N2, Ar, Air, and Mixed gas depending on what kind of material will be treated. ( Please select the two-channel gas mixer from the model selection)
  • <5% H2 mixed inert gas can be used
  • No flammable gas shall be used for the plasma cleaner.
Overall dimension
 Net Weight of Plasma Cleaner 40 Lbs
Shipping Weight & Dimensions 100 lbs
40"x24"x26"


Optional Accessories
  • You may order a Removable Quartz tube(80 O.D, 205 L mm) at extra cost.
  • Combinations of PCE-3 plasma cleaner with Two Channel Gas Mixer will be a solution for introducing up to two (2) process gases. Order plasma cleaner with the two-channel gas mixer from product options or Click the picture below for Two-Channel Gas Mixer.
  • You may order a quartz wafer carrier to clean 2" wafer
Compliance
  • CE approval
  • NRTL certification is NOT available temporarily.
Warranty One-year limited warranty with lifetime support ( no warranty for Pyrex glass chamber )