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1700°C Vertical Atmosphere Controlled Furnace (11" I.D., 13 Liter) with Automatic Bottom Loading - VBF-1600X-B
1700°C Vertical Atmosphere Controlled Furnace (11" I.D., 13 Liter) with Automatic Bottom Loading - VBF-1600X-B
VBF-1600X-B is a vertical atmosphere-controlled furnace with an 11" I.D. x 13"L sealed chamber and automatic bottom loading mechanism. Water-cooled SS vacuum flanges are lifted via the motor and can achieve vacuum 10-2 torr through a mechanical pump. It is designed for sintering material or annealing semiconductor wafers under vacuum or various other gas atmospheres with a temperature up to 1600°C. A programmable temperature controller, vacuum pump, and recirculating water chiller are included for immediate use.
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$21,898.80
Original: $72,996.00
-70%1700°C Vertical Atmosphere Controlled Furnace (11" I.D., 13 Liter) with Automatic Bottom Loading - VBF-1600X-B—
$72,996.00
$21,898.80More Images


1700°C Vertical Atmosphere Controlled Furnace (11" I.D., 13 Liter) with Automatic Bottom Loading - VBF-1600X-B
VBF-1600X-B is a vertical atmosphere-controlled furnace with an 11" I.D. x 13"L sealed chamber and automatic bottom loading mechanism. Water-cooled SS vacuum flanges are lifted via the motor and can achieve vacuum 10-2 torr through a mechanical pump. It is designed for sintering material or annealing semiconductor wafers under vacuum or various other gas atmospheres with a temperature up to 1600°C. A programmable temperature controller, vacuum pump, and recirculating water chiller are included for immediate use.
SPECIFICATIONS
|
Features |
|
|
Power |
|
|
Working Temperature |
|
|
Heating Elements |
|
|
|
|
|
Control Panel |
|
|
Compliance |
|
Product Information
Product Information
Shipping & Returns
Shipping & Returns
Description
VBF-1600X-B is a vertical atmosphere-controlled furnace with an 11" I.D. x 13"L sealed chamber and automatic bottom loading mechanism. Water-cooled SS vacuum flanges are lifted via the motor and can achieve vacuum 10-2 torr through a mechanical pump. It is designed for sintering material or annealing semiconductor wafers under vacuum or various other gas atmospheres with a temperature up to 1600°C. A programmable temperature controller, vacuum pump, and recirculating water chiller are included for immediate use.
SPECIFICATIONS
|
Features |
|
|
Power |
|
|
Working Temperature |
|
|
Heating Elements |
|
|
|
|
|
Control Panel |
|
|
Compliance |
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